科学研究

Optimization of line edge roughness before and after etching with photoresist in soft x-ray interference lithography

Tang Zhaohui, Deng Xiao, Cai Yanni, et al. Proc Spie, 2020, 11617.

发布时间:2020-12-04 发布者: 来源: 浏览:

Tang Zhaohui, Deng Xiao, Cai Yanni, et al. Proc Spie, 2020, 11617.