论文：
1. Wang, Z.; Li, T.; Zhang, Z.*; Chang, C.; Xia, J.; Zhang, Z.; Jiang, L.*; Qi, R.; Huang, Q.; Zhang, Z.; et al. The Influence of Background Pressure on Microstructure and Chemical State of WC/SiC Multilayers Prepared by Magnetron Sputtering. Surf. Coatings Technol. 2025, 507, 132148.
2. Yao, D.; Zhang, Z.*; Liu, X.; Huang, Q.; Liu, X.; Huang, S.*; Qi, R.; Zhang, Z.; Liu, S.; Zheng, L.; et al. Fabrication and Characterization of TiO2 and SiO2 as Protective Coating for Mo/Si Multilayer by Ion Beam Sputtering. Vacuum 2025, 238, 114287.
3. Wang, Z.; Lai, B.; Zhang, Z.*; Chang, C.; Wu, Y.; Jiang, L.; Qi, R.; Huang, Q.; Zhang, Z.; Wang, Z.* Impact of Mo Barrier Layers on the Interface and Microstructure of Al/Sc Multilayers for the Extreme Ultraviolet Range. ACS Appl. Mater. Interfaces 2025.
4. Zhang, Z.; Qi, R.*; Huang, Q.; Feng, Y.; Zhang, Z.; Huo, T.; Zhou, H.; Wang, Z. Narrowband Mg/SiC Multilayer Mirror Working as High-Harmonic Selector at 30.4 Nm Wavelength. J. Opt. (United Kingdom) 2024, 26.
5. Liu, X.; Zhang, Z.*; Jiang, L.; Song, H.; Yao, D.; Huang, S.*; Xu, W.; Huo, T.; Zhou, H.; Qi, R.; et al. Thickness Control and Thermal Stability of Large-Diameter Mo/Si Multilayer Films for Extreme Ultraviolet Source. Zhongguo Jiguang/Chinese J. Lasers 2024, 51, 1–9.
6. Wang, Z.; Zhang, Z.*; He, J.; Giglia, A.; Zhang, Q.; Qi, R.; Huang, Q.; Yi, S.; Zhang, Z.; Wang, Z. Structural and Optical Performance of NiV/Ti Multilayer Mirrors for Z-Pinch Plasma Diagnostic at the Wavelength Region of 350–450 eV. Opt. Lett. 2024, 49, 2237.
7. Wang, Z.; Li, T.; Zhang, Z.*; Chang, C.; Xia, J.; Zhang, Z.*; Jiang, L.; Qi, R.; Huang, Q.; Zhang, Z.; et al. Evolution of Interface and Surface Morphology of WC/SiC Multilayers with Increase in Number of Bilayers. Vacuum 2024, 230, 113750.
8. Song, H.; Zhang, Z.*; Liu, X.; Huang, Q.; Zhou, H.; Huo, T.; Qi, R.; Zhang, Z.; Xin, Z.*; Wang, Z. Comparison of Thermal Stability of Mo/Si Multilayers with Different Crystallinities of Mo Layers. Appl. Opt. 2023, 62, 2636.
9. Zhang, Z.; Yi, S.; Huang, Q.; Chen, S.; Li, W.; Zhang, Z.; Wang, Z.* Research Progress of Normal-Incidence Optical System at Extreme Ultraviolet（EUV）wavelength. Guangxue Jingmi Gongcheng/Optics Precis. Eng. 2022, 30, 2678–2687.
10. Zhang, Z.; Li, W.*; Huang, Q.; Zhang, Z.; Yi, S.; Pan, L.; Xie, C.; Wachulak, P.; Fiedorowicz, H.; Wang, Z*. A Table-Top EUV Focusing Optical System with High Energy Density Using a Modified Schwarzschild Objective and a Laser-Plasma Light Source. Rev. Sci. Instrum. 2018, 89.
专利：
(1)黄秋实;王占山;张哲;齐润泽;张众;抗环境侵蚀极紫外多层膜表面保护层快速制备方法及应用,2020-9-10,中国, ZL202010945223.0 (专利)
(2)李文斌;张哲;王占山;一种桌面型高能量密度极紫外辐照损伤测试装置, 2018-6-11,中国, ZL201810596643.5 (专利)
(3)李文斌;徐海钊;张哲;王占山;一种Schwarzschild物镜焦平面定位装置及定位方法, 2016-12-29,中国, ZL201611240849.1 (专利)
(4)王占山;张哲;吴子若;伊圣振;一种八通道Kirkpatrick-Baez显微镜的精密装配方法, 2016-9-30,中国, ZL201610874398.0 (专利)
