论文:
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专利:
授权时间 |
代表性授权专利名称及专利号 |
排名 |
2020.7 |
一种二维原子光刻栅格结构制备方法201810548515.3 |
第三 |
2020.6 |
一种用于实现分步沉积型二维原子光刻的装置 201810548512.X |
第三 |