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A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope
Time:2021-05-03
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Xiao Deng, Gaoliang Dai, Jie Liu, et al, Ultramicroscopy, 2021,226.
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Critical dimension scanning electron microscope characterization of smoothly varying wave structures with MC simulation
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Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings
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