This division is equipped with a 1000-core CPU and 15 TB memory for simulation, as well as the self-controllable high-efficiency basic industrial software for optical field simulations, which can satisfy a rapid simulation and the design of micro-nano optical devices and macro-micro integrated optical systems. The division possesses a 6-inch spin coater, an 8-inch high-resolution electron beam lithographic system, a low-temperature reactive ion etching system, an atomic layer deposition machine, and other essential fabrication equipment for micro-nano optical devices. Furthermore, various testing platforms are also available, including a scanning electron microscope, an atomic force microscope, and an angular resolution testing system. In summary, the division has demonstrated competitive strengths in the manufacturing and characterization of micro-nano structures.