Research

Micro-nano Optical Devices and Integrated Applications

This division is devoted to the study of the regulation mechanism, device design, characteristic fabrication, and integrated applications of wafer-level micro-nano optical devices. The research direction focuses on theories of optical field modulation, computational electromagnetism, micro-nano machining technology, and on-chip integration applications.

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Team

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Haoran Li

2018 PhD Candidate

Scattering characteristics and experimental research

Jianyu Zhou

2018 PhD Candidate

On chip filtering microstructure

Haigang Liang

2019 PhD Candidate

inverse design of high-efficient metasurface

Zhanyi Zhang

2019 PhD Candidate

Design and Fabrication of optical metasurfaces

Xue Dongbai

2020 PhD Candidate

Laser interference lithography system and holographic grating preparation technology research

Chengfeng Li

2020 PhD Candidate

Design, fabrication and application of optical metasurface

Xiaojia Liang

2020 PhD Candidate

Metasurface

Shuqiao Li

2021 PhD Candidate

On-chip Devices

Weijie Xv

2021 PhD Candidate

Deep learning-based nanophotonics inverse design and electromagnetic field simulation

Chao Feng

2021 PhD Candidate

Design and fabrication of high efficiency metasurface

Yijie Luo

2021 PhD Candidate

Broadband anomalous reflections of microwave frequencies metasurfaces

Yi Ning

2021 PhD Candidate

Metasurface design and fabrication

Xvhao Luo

2021 PhD Candidate

Design, fabrication and application of optical metasurface

Haoyu Li

2022 PhD Candidate

On-chip optical computing, design of optical metasurface, numerical simulation calculations

Linyuan Dou

2022 PhD Candidate

On-chip metasurface design and numerical simulation

Xiaofeng Rao

2022 PhD Candidate

Design and fabrication of metasurface

Zhiyuan Ma

2022 PhD Candidate

Nonlinear optics in micro-nano structures and devices

Hong Luo

PhD candidate

Optical tweezers

Chengfeng Lu

2022 PhD candidate

Optofluidic tweezers and optical forces

Liang Liu

2022 PhD Candidate

Supersurface design and preparation

Research Infrastructure

This division is equipped with a 1000-core CPU and 15 TB memory for simulation, as well as the self-controllable high-efficiency basic industrial software for optical field simulations, which can satisfy a rapid simulation and the design of micro-nano optical devices and macro-micro integrated optical systems. The division possesses a 6-inch spin coater, an 8-inch high-resolution electron beam lithographic system, a low-temperature reactive ion etching system, an atomic layer deposition machine, and other essential fabrication equipment for micro-nano optical devices. Furthermore, various testing platforms are also available, including a scanning electron microscope, an atomic force microscope, and an angular resolution testing system. In summary, the division has demonstrated competitive strengths in the manufacturing and characterization of micro-nano structures.


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