UV contract lithography

Brand: Institute of Optics and Electronics, Chinese Academy of Sciences

Introduction: Ultraviolet lithography machine is to use a certain wavelength of ultraviolet light, through the mask plate to make a specific area of light through, thereby irradiating to the photoresist surface for exposure. Ultraviolet lithography is a typical large-area lithography technique that can quickly replicate micro-nano optics. The used wavelength is generally 365nm, the limit exposure resolution is 1μm, the alignment accuracy is 0.6μm, the maximum mask size is 5 inches, the sample size supports a variety of irregular sheets and 4-inch wafers, and there are four functions of vacuum contact exposure, hard contact exposure, pressure contact exposure and proximity exposure. At the same time, UV nanoimprinting is available with a maximum resolution of 50nm.