Electron beam lithography

Model: EBPG 5200

Brand: Raith

Introduction: It is mainly used for the graphical exposure of micro-nano optics and lithography/nanoimprint masks. The electron beam emitted by the electron gun is focused through the electromagnetic lens to form a high-resolution Gaussian electron beam spot, and the photoresist on the substrate is exposed. It is a flexible and highly automated maskless exposure device. The operating voltage is 100kV, the beam current is from 0.1nA to 200pA, and the minimum beam spot size is ≤3nm. The minimum exposure line width is less than 7.8nm, the maximum processing area is 8-inch wafer or 6-inch mask, the maximum exposure writing field of the electron beam is 1mm*1mm, and the maximum clock frequency is 125MHz.