Research

Jingyuan ZhuMore

  • Title:Postdoctoral Fellow
  • Tel:20310078@tongji.edu.cn
  • Office:Minhang Micro-Nano Laboratory
  • Information of Tutors:

Graduated from the School of Information Science and Engineering of Fudan University, he is mainly engaged in the research of micro-nano processing technology with electron beam lithography as the core, its micro-nano optical devices and X-ray diffraction elements. He has participated in the National Natural Science Foundation of China Joint Cultivation Project, Major Project, 173 and other scientific research projects, and published many SCI articles in Microelectronic Engineering, ECS Journal of Solid-State Science and Technology, Chinese Physics B and other journals.

  • Personal Experience
  • Research Areas
  • Teach Courses
  • Research Project
  • Academic Achievements
  • Honors and Awards

Work experience

June 2020–present, School of Physical Science and Engineering, Tongji University, Postdoctoral Fellow


Educational experience

2017.08 - 2020.07, Fudan University, Microelectronics and Solid-State Electronics, Ph.D., supervisor: Chen Yifang

2014.09 - 2017.07, University of Shanghai for Science and Technology, Optical Engineering, Master, Supervisor: Zhang Xuedian

2010.09 - 2014.07, University of Shanghai for Science and Technology, Optoelectronic Information Science Engineering, B.S


Develop the design and nanofabrication technology of micro-nano optical devices, carry out cross-scale preparation technology of practical micro-nano optical devices and innovative preparation process research of extremely small size X-ray diffraction elements, including: elucidating the mechanism of action between electrons and substances, innovating the uniform glue throwing process of large-area special-shaped substrates, developing electron beam lithography error control methods for nanostructures of different feature sizes and large-aperture devices, and exploring the deposition and etching conformal preparation technology of micro-nano optical structures of metal/dielectric materials.


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Thesis

1. Jingyuan Zhu, Siliang Zhou, Yi Ning, Xiong Dun, Siyu Dong*, Zhanshan Wang, and Xinbin Cheng*,Grayscale-patterned integrated multilayer-metal-dielectric microcavities for on-chip multi/hyperspectral imaging in the extended visible bandwidth, Optics Express 31, 14027-14036 (2023)

2. Jingyuan Zhu, Yi Ning, Lingyun Xie, Siyu Dong, Xinbin Cheng, Zhanshan Wang, and Yifang Chen, "Dispersion-engineered broadband diffractive optical elements with multilayer subwavelength structures," Appl. Opt. 62, B19-B24 (2023)

3. Zhu, J.; Ning, Y.; Liu, L.; Dong, S.; Chen, Y.; Wang, Z.; Cheng, X. Design and Fabrication of Highly Selective Polarizers Using Metallic–Dielectric Gratings. Photonics 2023, 10, 52.

4. Hongguang Qi, Lingyun Xie, Jingyuan Zhu, Zeyong Wei, Hongfei Jiao, Yury Gennadievich Smirnov, Alexander Tikhonravov, Zhanshan Wang, and Xinbin Cheng, "High-efficiency, polarization-insensitive 1400-lines/mm retroreflective metagrating with cascaded nano-optical modes," Opt. Lett. 47, 3972-3975 (2022)

5. Zhu J, Sun Z , Chen Y , et al. A Cost Effective Process for Large Area Photonic Array Applied in Light Emitting Diodes for Light Extraction Enhancement[J]. ECS Journal of Solid State Science and Technology, 2019, 8(9):R114-R118.

6. Zhu J, Chen Y , Xie S , et al. Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging[J]. Microelectronic Engineering, 2020, 225:111254.

7. Zhu J, Zhang S, Xie S, et al. Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging[J].Chinese Physics B, 2020, 29(4):6.

8. Zhu J, Zhang S, Lu B, et al. Comparison Study of Optical Sensing Property of Gratings with and without Lamellae Layers[J]. ECS Journal of Solid State Science and Technology, 2020, 9(4): 045006.


Patent:

1. Preparation method of suspended thick gold wave strip lens without substrate support

Application/patent number: CN109243662A

Inventor: Yifang Chen; Xin Li; Chen Xu; Sichao Zhang; Jingyuan Zhu; Shanshan Xie; Bingrui Lu

2. Preparation method of A metal-dielectric polarization grating.

Application/patent number: CN202310029560.9

Inventor: Xinbin Cheng; Jingyuan Zhu; Siyu Dong; Zhanshan Wang; Yi Ning; Liang Liu;

3. Preparation method of a metal-dielectric hybrid material FP cavity filter array.

Application/patent number: CN202211014190.3

Inventor: Xinbin Cheng; Jingyuan Zhu; Siyu Dong; Jianyu Zhou; Zhanshan Wang;


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