Research

Dual-function large-size column-symmetric sputtering machine 5#

Introduction: This machine prepares reflective films for large planar and columnar surfaces used in optical reflectors for wavelengths ranging from extreme ultraviolet to X-ray bands. It produces W/Si multilayer film, Cr/C multilayer film, Pt single-layer film, and so on. The machine can handle up to a 150×430mm sample size and achieves a thickness uniformity accuracy of 1%. Suitable for making different types of big mirrors, filters, tools for splitting light into different colours, and other thin layers in systems that use extreme ultraviolet, X-rays, and neutron beams.