Introduction: Magnetron sputtering is used to prepare various large-sized planar/circularly symmetric curved optical mirror films in the extreme ultraviolet to X-ray bands, such as W/Si multilayer films, Cr/C multilayer films, Pt monolayer films, etc. Sample size: Φ 200mm; Thickness uniformity accuracy: 1%. Suitable for the preparation of various large-sized mirrors, polarizers, monochromators, and other thin films in extreme ultraviolet, X-ray, and neutron optical systems.