Introduction: Magnetron sputtering is used to prepare various optical thin films in the extreme ultraviolet to X-ray bands, such as W/Si multilayer films, Cr/C multilayer films, Pt monolayer films, etc. Sample size: Φ 100mm; Thickness uniformity accuracy: better than 2%. Suitable for the preparation of various small-sized mirrors, polarizers, and monochromator films in extreme ultraviolet, X-ray, and neutron optical systems.