Articles：
(1)Zhang, Zhe; Qi, Runze; Yao, Yiyun; Shi, Yingna; Li, Wenbin; Huang, Qiushi; Yi, Shengzhen; Zhang, Zhong; Wang, Zhanshan; Xie, Chun ; Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique,Coatings, 2019, 9(12): 851 (期刊论文)
(2) Wei, Zhenbo;Zhang, Zhe*; Jiang, Li; Yang, Yang; Chang, Chenyuan; Feng, Yufei; Qi, Runze; Huang, Qiushi; Yan, Wensheng; Xie, Chun; Wang, Zhanshan ; Background Pressure Induced Structural and Chemical Change in NiV/B4C Multilayers Prepared by Magnetron Sputtering,Frontiers in Physics, 2022, 10: 837819 (期刊论文)
(3)Zhang, Zhe; Li, Wenbin; Huang, Qiushi; Zhang, Zhong; Yi, Shengzhen; Pan, Liuyang; Xie, Chun; Wachulak, Przemyslaw; Fiedorowicz, Henryk; Wang, Zhanshan ; A table-top EUV focusing optical system with high energy density using a modified Schwarzschild objective and a laser-plasma light source,Review of Scientific Instruments, 2018, 89(10): 103109 (期刊论文)
(4) Tanksalvala, Michael; Porter, Christina L.; Esashi, Yuka; Wang, Bin; Jenkins, Nicholas W.;Zhang, Zhe; Miley, Galen P.; Knobloch, Joshua L.; McBennett, Brendan; Horiguchi, Naoto; Yazdi, Sadegh; Zhou, Jihan; Jacobs, Matthew N.; Bevis, Charles S.; Karl, Robert M., Jr.; Johnsen, Peter; Ren, David; Waller, Laura; Adams, Daniel E.; Cousin, Seth L.; Liao, Chen-Ting; Miao, Jianwei; Gerrity, Michael; Kapteyn, Henry C.; Murnane, Margaret M. ; Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry,Science Advances, 2021, 7(5): eabd9667 (期刊论文)
(5)Zhang, Zhe; Huang, Qiushi; Qi, Runze; Chen, Jiaqi; Feng, Qinxu; Feng, Yufei; Zhou, Hongjun; Huo, Tonglin; Wang, Zhanshan ; Narrowband Mg/SiC Multilayers Working around 30.4 nm,Optical Interference Coatings, Santa Ana Pueblo, New Mexico United States, 2019-06-02至2019-06-07 (会议论文)
Patents：
(1) Huang Qiushi; Wang Zhanshan; Zhang Zhe; Qi Runze; Zhang Zhong; Rapid Preparation Method and Application of Extreme Ultraviolet Multilayer Surface Protection Layer against Environmental Erosion,2020-9-10, China, ZL202010945223.0 (Patent)
(2) Li Wenbin; Zhang Zhe; Wang Zhanshan; A tabletop High Energy density Extreme ultraviolet radiation damage test device, 2018-6-11, China, ZL201810596643.5 (Patent)
(3) Li Wenbin; Xu Haizhao; Zhang Zhe; Wang Zhanshan; Schwarzschild Objective Lens focal plane positioning device and positioning Method, 2016-12-29, China, ZL201611240849.1 (Patent)
(4) Wang Zhanshan; Zhang Zhe; Wu Ziruo; Isengen; A precision Assembly method for eight-channel Kirkpatrick-Baez Microscope, 2016-9-30, China, ZL201610874398.0 (Patent)
