科学研究

LIDT of HfO2 SiO2 HR films by different test modes at 1064nm and 532nm

​Ma B , Tao D , Jiao H , et al. Proceedings of Spie the International Society for Optical Engineering, 2010, 7842.

发布时间:2010-10-02 发布者: 来源: 浏览:

Ma B , Tao D , Jiao H , et al. Proceedings of Spie the International Society for Optical Engineering, 2010, 7842.