论著列表-同济大学精密光学工程技术研究所

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代表性论著论著列表

31、Interference suppression of light backscattering through oblique deposition of a layered reflecting coating bi-layer on a substrate
Zhang J , Fang S , Kozhevnikov I V , et al. Optics Express, 2020, 28(21)
32、Amorphous Si critical dimension structures with direct Si lattice calibration
Wu Ziruo, Cai Yanni, Wang Xingrui, et al. Chinese Phys B, 2019, 28(3)
33、Realization of orthogonality in two-step laser focused Cr atomic deposition
Deng Xiao, Liu Jie, Zhu Li, et al. Optik, 2019, 185: 423-8
34、Optimization of Atom Flux in Atom Lithography
Chen Jie,Liu Jie,Zhu Li,et al. ACTA OPTICA SINICA,2018,38(12):28-32
35、Process optimization of selective wet etching for fabrication of high aspect-ratio and uniform multilayer grating reference materials
Zhang Longfei, Wang Xingrui, Cheng Xinbin, et al. J Micro-Nanolith Mem, 2018, 17(4)
36、Laser-induced damage of nodular defects in dielectric multilayer coatings
Zhang J , Jiao H , Ma B , et al. Optical Engineering, 2018, 57(12)
37、Deposition of Cr Atoms Using Switching-Detuning Light Mask for Direct Atom Lithography
Zhu Li, Deng Xiao, Liu Jie, et al. Curr Nanosci, 2019, 15(6): 626-30
38、Simulation of surface reconstruction of the one-dimensional rectangle grating AFM images by blind reconstructed tip
Hu Mingxia,Ma Yan. OPTICAL INSTRUMENTS,2018,40(03):52-59
39、Natural square ruler at nanoscale
Deng Xiao, Liu Jie, Zhu Li, et al. Appl Phys Express,2018;11(7)
40、Effect of Surface and Sub-surface CharacterIstics on the Contrast of Multilayer FiIm Grating Imaging
Zhang Longfei,Wang Xingrui,Deng Xiao,et al. ACTA METROLOGICA SINICA,2018,39(03):299-303

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