Develop the design and nanofabrication technology of micro-nano optical devices, carry out cross-scale preparation technology of practical micro-nano optical devices and innovative preparation process research of extremely small size X-ray diffraction elements, including: elucidating the mechanism of action between electrons and substances, innovating the uniform glue throwing process of large-area special-shaped substrates, developing electron beam lithography error control methods for nanostructures of different feature sizes and large-aperture devices, and exploring the deposition and etching conformal preparation technology of micro-nano optical structures of metal/dielectric materials.

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Thesis

1. Jingyuan Zhu, Siliang Zhou, Yi Ning, Xiong Dun, Siyu Dong*, Zhanshan Wang, and Xinbin Cheng*,Grayscale-patterned integrated multilayer-metal-dielectric microcavities for on-chip multi/hyperspectral imaging in the extended visible bandwidth, Optics Express 31, 14027-14036 (2023)

2. Jingyuan Zhu, Yi Ning, Lingyun Xie, Siyu Dong, Xinbin Cheng, Zhanshan Wang, and Yifang Chen, "Dispersion-engineered broadband diffractive optical elements with multilayer subwavelength structures," Appl. Opt. 62, B19-B24 (2023)

3. Zhu, J.; Ning, Y.; Liu, L.; Dong, S.; Chen, Y.; Wang, Z.; Cheng, X. Design and Fabrication of Highly Selective Polarizers Using Metallic–Dielectric Gratings. Photonics 2023, 10, 52.

4. Hongguang Qi, Lingyun Xie, Jingyuan Zhu, Zeyong Wei, Hongfei Jiao, Yury Gennadievich Smirnov, Alexander Tikhonravov, Zhanshan Wang, and Xinbin Cheng, "High-efficiency, polarization-insensitive 1400-lines/mm retroreflective metagrating with cascaded nano-optical modes," Opt. Lett. 47, 3972-3975 (2022)

5. Zhu J, Sun Z , Chen Y , et al. A Cost Effective Process for Large Area Photonic Array Applied in Light Emitting Diodes for Light Extraction Enhancement[J]. ECS Journal of Solid State Science and Technology, 2019, 8(9):R114-R118.

6. Zhu J, Chen Y , Xie S , et al. Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging[J]. Microelectronic Engineering, 2020, 225:111254.

7. Zhu J, Zhang S, Xie S, et al. Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging[J].Chinese Physics B, 2020, 29(4):6.

8. Zhu J, Zhang S, Lu B, et al. Comparison Study of Optical Sensing Property of Gratings with and without Lamellae Layers[J]. ECS Journal of Solid State Science and Technology, 2020, 9(4): 045006.

Patent:

1. Preparation method of suspended thick gold wave strip lens without substrate support

Application/patent number: CN109243662A

Inventor: Yifang Chen; Xin Li; Chen Xu; Sichao Zhang; Jingyuan Zhu; Shanshan Xie; Bingrui Lu

2. Preparation method of A metal-dielectric polarization grating.

Application/patent number: CN202310029560.9

Inventor: Xinbin Cheng; Jingyuan Zhu; Siyu Dong; Zhanshan Wang; Yi Ning; Liang Liu;

3. Preparation method of a metal-dielectric hybrid material FP cavity filter array.

Application/patent number: CN202211014190.3

Inventor: Xinbin Cheng; Jingyuan Zhu; Siyu Dong; Jianyu Zhou; Zhanshan Wang;

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