Articles:
1.Runze Qi, Qiushi Huang, Yang Yang, Zhong Zhang. Zhanshan Wang*. Stress and Microstructure Study of W/Si X-ray Multilayers with Different Structural Parameters,Journal of Nanoscience and Nanotechnology, 2019, 19(1): 568-574(7).
2.Liuyang Pan,Runze Qi*, Yufei Feng, Jiaqi Chen, Zhong Zhang, Wenbin Li, Zhanshan Wang*. Effect of nitrogen doping on surface morphology, microstructure, chemical composition and intrinsic stress of nickel thin films deposited by reactive sputtering. Surface and Coatings Technology, 2019, 364: 196-203.
3.Runze Qi, QiushiHuang*, Jiani Fei, Igor V. Kozhevnikov, Yang Liu, Pin Li, Zhong Zhang, Zhanshan Wang*.Evolution of the internal structure of short-period Cr/V multilayers with different vanadium layers thicknesses. Materials ,2019, 12(18): 2936.
4.Runze Qi,Liuyang Pan, Yufei Feng, Jiali Wu, Wenbin Li, Zhanshan Wang*. Evolution of chemical, structural, and mechanical properties of titanium nitride thin films deposited under different nitrogen partial pressure. Results in Physics, 2020,19:103416.
5.Yang Yang,Runze Qi*,Zhong Zhang, Yiyun Yao, Hangjian Ni,Zhanshan Wang, Huarui Wu, Xuewu Wang, Zhong Z A , et al. Ni-Ti supermirror coated onto a curved substrate for nested neutron-focusing optics. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2021, 986:164752
6.Yufei Feng,Runze Qi*, Li Jiang, Qiushi Huang, Tongzhou Li, Genchang Liu, Wenbin Li, Wensheng Yan, Zhong Zhang and Zhanshan Wang. Chemical Modification of B4C Films and B4C/Pd Layers Stored in Different Environments. Materials, 2021, 14:1319
7.Handan Huang, Li Jiang, Yiyun Yao, Zhong Zhang, Zhanshan Wang andRunze Qi*.Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution. Coatings，2021, 11(5):599
8.Runze Qi, Qiushi Huang, Yang Yang, Zhang Zhong, Zhanshan Wang*. Effects of sputtering parameters and separator plates on the structure and stress of w/si multilayers in x-ray telescope applications. Optical Engineering, 2017, 56(3), 035103.1-035103.6.
9.Changqing Wang, Zhanshan Wang, Zhong Zhang,Runze Qi*.Calculation and verification of linear target deposition distribution. Proc. SPIE, 2020, 11617:116171M
10.Jiali Wu,Runze Qi*, Zhanshan Wang, Qiushi Huang, Xianyong Bai,Structure and stability of Sc/Si multilayers with different thickness ratio for wavelength at 46.5 nm. Proc. SPIE, 2020, 11491:1149106
Patents：
授权时间 |
代表性授权专利名称及专利号 |
排名 |
2019.6 |
一种用于涂硼中子探测器富硼涂层的薄膜结构，CN201910180279.9 |
第一 |
2022.1 |
基于线型磁控溅射靶枪的大尺寸平面基底镀膜方法及装置，CN202010913247.8 |
第二 |
2021.2 |
一种直线型多功能磁控溅射镀膜设备及镀膜方法，CN202011079375.3 |
第二 |
2019.3 |
一种双功能柱对称大尺寸高均匀性线型磁控靶镀膜设备，ZL 201710247265.5 |
第三 |
2019.3 |
一种提高线型磁控溅射靶枪在凹形柱面基底镀膜质量的方法，ZL 201710247339.5 |
第三 |
2020.11 |
一种提高线型磁控溅射靶枪在凹形柱面基底镀膜质量的方法，ZL 201710247339.5 |
第三 |
2021.1 |
一种超高精度多层膜厚度漂移误差标定方法，CN202010945043.2 |
第三 |
