Mainly engaged in the research of grating reference material and nanometrics.

paper:

[1]Xiao D, Gd B , Jie L A , et al. A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope[J]. , 2021, 226.

[2] Liu J , Zhao J , Deng X, et al. Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings[J]. Nanotechnology, 2021, 32(17):1753 01 -.

[3] Khan M S S , Yang L H ,Deng X, et al. Critical-dimension scanning electron microscope characterization of smoothly varying wave structures with a Monte Carlo simulation[J]. Journal of Physics D: Applied Physics, 2021, 54(44) :445301 (14pp).

[4] Jie Chen, Jie Liu, Li Zhu,Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of laser focused atomic deposition by channeling[J]. Chinese Physics B, 2020, v.29(02):207-212.

[5]Xiao Deng, Jie Liu, et al. Realization of orthogonality in two-step laser focused Cr atomic deposition - ScienceDirect[J]. Optik, 2019, 185:423-428.

[6]Deng X, Liu J, Zhu L, et al. Natural square ruler at nanoscale[J]. Applied Physics Express, 2018, 11(7):075201.

[7] Chen Jie, Liu Jie, Wang Xingrui, Zhang Longfei, Deng Xiao, et al. Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis[J]. Measurement Science Review, 2017, 17(6).

[8] Zhu Li, Deng Xiao, Liu Jie, Cheng Xinbin, Li Tongbao. Deposition of Cr Atoms Using Switching-Detuning Light Mask for Direct Atom Lithography[J]. Current Nanoscience, 2018, 14(6).

[9] Z Wu, Y Cai, X Wang, L Zhang, X Deng, X Cheng, T Li. Amorphous Si critical dimension structures with direct Si lattice calibration[J]. Chinese Physics B, 2019, 28(3):030601 (5pp).

[10] L Zhang, X Wang, X Cheng, X Deng. Process optimization of selective wet etching for fabrication of high-aspect-ratio and uniform multilayer grating reference materials[J]. Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2018, 17(4).

[11] Chen Jie, Liu Jie, Zhu Li, Deng Xiao, Cheng Xinbin, Li Tongbao. Research on optimization of atomic flux in atomic lithography [J]. Acta Optics Sinica, 2018, 38(12):5.

[12] Xiqiao Wang, Pradeep Namboodiri, Kai Li, Xiao Deng, and Richard Silver. Spatially resolved scanning tunneling spectroscopy of single-layer steps on Si(100) surfaces[J]. Physical review, 2016, 94(12):125306.1 -125306.12.

[13]Xiao D, Namboodiri P, Kai L, et al. Silicon epitaxy on H-terminated Si (100) surfaces at 250 °C[J]. Applied Surface Science, 2016, 378.

[14]Xiao D, Li T B, Lei L H, et al. Fabrication and measurement of traceable pitch standard with a big area at trans-scale[J]. Chinese Physics B,2014,23(09):147-151.

[15]Deng X, Ma Y, Zhang P, et al. Investigation of shadow effect in laser-focused atomic deposition[J]. APPLIED SURFACE SCIENCE, 2012, 261:464-469.

patent:

[1] A preparation method of self-traceable grating reference material that accurately shortens the pitch value 202010575620.3  second inventor

[2] A method for preparing a two-dimensional atomic lithographic grid structure 201810548515.3  second inventor

[3] A device for realizing step-by-step deposition two-dimensional atomic lithography ZL201810548512.X   second inventor

1. In 2022, two-dimensional chromium nanogrid standard material (GBW(E)130838), national secondary standard material

2. In 2021, one-dimensional chromium nano-grating standard material (GBW13982), national first-class standard material

3. In 2021, one-dimensional silicon nanograting standard material (GBW13983), a national first-class standard material

4. In 2021, multi-structure silicon nanowire width standard material (GBW(E)130744), national secondary standard material

5. In 2021, he will be selected into the Young Talents Promotion Project of China Association for Science and Technology