主要从事集成电路计量测试技术研究，具体包括原子光刻、光栅干涉仪、MOEMS加速度计等技术。

论文：

[1] Zichao Lin, Yulin Yao, Zhangning Xie, Dongbai Xue, Tong Zhou, Zhaohui Tang, Lihua Lei, Tao Jin, Xiong Dun, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer[J]. Precision Engineering, 2023, 86: 285-293.

[2] Zhangning Xie, Tao Jin, Lihua Lei, Zichao Lin, Yulin Yao, Dongbai Xue, Xiong Dun, Xiao Deng, Xinbin Cheng. Study of interferometric signal correction methods in ultra-precision displacement measurement[J]. Measurement Science and Technology, 2023, 35(3): 035027.

[3] Xiong Yingfan, Jinming Gou, Zhaohui Tang, Guangxu Xiao, Lihua Lei, Song Song, Xiao Deng, Xinbin Cheng. Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings[J]. Photonics, 2023, 10(11): 1272.

[4] 尹志珺, 王振兴, 李荃, 宋仁康, 邓晓, 雷李华. 声子极化激元干涉条纹周期的精密测量研究[J]. 红外与激光工程, 2023.

[5] 常郅坤, 张婉怡, 沈箫雨, 牟群, 韩晓玲, 宋松, 牛鹏飞, 邓晓, 程鑫彬. 自溯源型MOEMS加速度计谐振子设计仿真研究[J]. 计量科学与技术, 2023.

[6] Zhaohui Tang, Jun Zhao, Xiao Deng, Guangxu Xiao, ZhiJun Yin, Yanqing Wu, Renzhong Tai, Xinbin Cheng, Tongbao Li. Two-dimensional sub-200 nm pitch Si gratings with natural orthogonality[J]. Applied Physics Express, 2023, 16(10): 106501.

[7] ZhiJun Yin, ZhaoHui Tang, Wen Tan, GuangXu Xiao, YuLin Yao, DongBai Xue, ZhenJie Gu, LiHua Lei, Xiong Dun, Xiao Deng, XinBin Cheng and TongBao Li. Simulation Research on Surface Growth Process of Positive and Negative Frequency Detuning Chromium Atom Lithographic Gratings[J]. Chinese Physics B, 2023, 32(10):1674.

[8] Wen Tan, Zhaohui Tang, Guangxu Xiao, Yulin Yao, Lihua Lei, Qing Li, Tao Jin, Xiao Deng, Xinbin Cheng, Tongbao Li. Calibrate the non-orthogonal error of AFM with two-dimensional self-traceable grating[J]. Ultramicroscopy, 2023, 249: 113734.

[9] Zhaohui Tang, Jun Zhao, Xiao Deng, Wen Tan, Yanqing Wu, Renzhong Tai, Xinbin Cheng, Tongbao Li. Fabrication of 53.2 nm pitch self-traceable gratings by laser-focused atomic deposition combined with extreme ultraviolet interference lithography[J]. Optik, 2023, 279: 170735.

[10] 张玉杰, 徐雷管, 钰睛, 邹文哲, 郭创为, 雷李华, 傅云霞, 郭珍艳, 顾振杰, 邓晓. 基于平面反射式全息光栅的激光自混合纳米位移测量研究[J]. 红外与激光工程, 2022.

[11] 陈凯睛, 管钰睛, 邹文哲, 邓晓, 孔明, 陈雅睛, 能英月, 值云雷, 雷李华. 基于铬原子光刻技术的纳米光栅间距比对测量定值方法研究[J]. 计量学报, 2022.

[12] 林子超, 姚玉林, 周通, 薛栋柏, 顾振杰, 邓晓, 程鑫彬, 李同保. 基于四维协变量的光栅干涉系统频移理论研究[J]. 计量科学与技术,2022.

[13] Deng Xiao, Tan Wen, Tang Zhaohui, Lin Zichao, Cheng Xinbin, Li Tongbao. Scanning and Splicing Atom Lithography for Self-traceable Nanograting Fabrication[J]. Nanomanufacturing and Metrology, 2022, 5: 179-187.

[14] 邓晓, 李同保, 程鑫彬. 自溯源光栅标准物质及其应用[J]. 光学精密工程, 2022.

[15] Wu Ziruo, Xiong Yingfan, Lei Lihua, Tan Wen, Tang Zhaohui, Deng Xiao, Cheng Xinbin, Li Tongbao. Sub-5 nm AFM Tip Characterizer Based on Multilayer Deposition Technology[J]. Photonics, 2022, 9(9): 665.

[16] Wei Zeyong, Li Shuqiao, Xie Lingyun, Deng Xiao, Wang Zhanshan, Cheng Xinbin. On-chip ultracompact multimode vortex beam emitter based on vertical modes[J]. Optics Express, 2021, 30(20): 36863-36872.

[17]Xiao D, Gd B , Jie L A , et al. A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope[J]. Ultramicroscopy, 2021, 226.

[18] Liu J , Zhao J ,Deng X, et al. Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings[J]. Nanotechnology, 2021, 32(17):175301-.

[19] Khan M S S , Yang L H ,Deng X, et al. Critical-dimension scanning electron microscope characterization of smoothly varying wave structures with a Monte Carlo simulation[J]. Journal of Physics D: Applied Physics, 2021, 54(44):445301 (14pp).

[20] Jie Chen, Jie Liu, Li Zhu,Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of laser focused atomic deposition by channeling[J]. Chinese Physics B, 2020, v.29(02):207-212.

[21] Xiao Deng, Jie Liu, et al. Realization of orthogonality in two-step laser focused Cr atomic deposition - ScienceDirect[J]. Optik, 2019, 185:423-428.

[22] Deng X, Liu J, Zhu L, et al. Natural square ruler at nanoscale[J]. Applied Physics Express, 2018, 11(7):075201.

[23] Chen Jie，Liu Jie，Wang Xingrui，Zhang Longfei，Deng Xiao, et al. Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis[J]. Measurement Science Review, 2017, 17(6).

[24] Zhu Li，Deng Xiao，Liu Jie，Cheng Xinbin，Li Tongbao. Deposition of Cr Atoms Using Switching-Detuning Light Mask for Direct Atom Lithography[J]. Current Nanoscience, 2018, 14(6).

[25] Z Wu，Y Cai，X Wang，L Zhang，X Deng，X Cheng，T Li. Amorphous Si critical dimension structures with direct Si lattice calibration[J]. Chinese Physics B, 2019, 28(3):030601 (5pp).

[26] L Zhang，X Wang，X Cheng，X Deng. Process optimization of selective wet etching for fabrication of high-aspect-ratio and uniform multilayer grating reference materials[J]. Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2018, 17(4).

[27]陈杰,刘杰,朱立,邓晓,程鑫彬,李同保.原子光刻中原子通量的优化研究[J].光学学报, 2018, 38(12):5.

[28] Xiqiao Wang, Pradeep Namboodiri, Kai Li,Xiao Deng, and Richard Silver. Spatially resolved scanning tunneling spectroscopy of single-layer steps on Si(100) surfaces[J]. Physical review, 2016, 94(12):125306.1-125306.12.

[29]Xiao D, Namboodiri P, Kai L, et al. Silicon epitaxy on H-terminated Si (100) surfaces at 250 °C[J]. Applied Surface Science, 2016, 378.

[30]Xiao D, Li T B, Lei L H, et al. Fabrication and measurement of traceable pitch standard with a big area at trans-scale[J]. Chinese Physics B,2014,23(09):147-151.

[31]Deng X, Ma Y, Zhang P, et al. Investigation of shadow effect in laser-focused atomic deposition[J]. APPLIED SURFACE SCIENCE, 2012, 261:464-469.

专利：

1.2022年，二维铬纳米栅格标准物质(GBW(E)130838)，国家二级标准物质

2.2021年，一维铬纳米光栅标准物质(GBW13982)，国家一级标准物质

3.2021年，一维硅纳米光栅标准物质(GBW13983)，国家一级标准物质

4.2021年，多结构硅纳米线宽标准物质(GBW(E)130744)，国家二级标准物质

5.2021年入选中国科学技术协会青年人才托举工程计划

6.2023年入选上海市“科技创新行动计划”启明星人才

7.2023年入选上海市“东方英才”（青年）人才计划